Swiss new media artist Marc Lee will give an English talk and shows his interactive artwork “Me, Myself and I” at an event Saturday.

“Me, Myself and I” wraps its mind around the excessive narcissism of online culture, serving up a warped slice of the selfie-driven pie.

Lee studied at the Basel University of Art and Design and the Zurich University of Arts. He has been creating network-oriented interactive projects since 1999 and now experiments with information and communication technologies. His projects locate and critically discuss economic, political, cultural and creative issues. His artworks reflect the visions and limits of our information society in an intelligent and artistic manner.

Time: 10:30-11:30 a.m., Sept. 28

Venue: Tongji Needs Space, Block 16, Shenzhen High-Tech Industrial Park, Nanshan District (南山区深圳科技园高北十六创意园同济未来需求空间)

Metro: Line 1 to Hi-Tech Park Station (高新站), Exit B and then take a taxi(SD News)